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Home | Archives for 2011

Archives for 2011

February 13, 2011

Cheshire Anilox Technology participates in Edale Open House

Cheshire Anilox Technology participated in the successful Open House organised by Edale.The event took place at Edale factory in Whiteley, Hampshire from 7th – 8th February 2011.

IMG_5493

It was a great opportunity to meet our customers and other key industry suppliers. As always the Edale team was excellent and the event was extraordinarily well organised. More than 100 visitors attended this event to see the new products and technology.

As well as the table top exhibiting section there was twenty minute presentations taking place throughout the day from different suppliers. Sonia Arcos , Sales Director of Cheshire Anilox Technology held a speech on the latest technology in Anilox rollers which was very well received.

The success of this event shows that customers are very interested in advances on Anilox technology as a key element in flexographic printing.

We are delighted to have taken part in such an interesting event and look forward to participating in future Edale open house events.

July 13, 2011

New robot–operated TriplexPro 200 Plasma coating plant installation

 

Cheshire Anilox Technology  is pleased to announce the completion of its new TriplexPro 200 Plasma spray coating plant. Robotically-operated can spray and handle Anilox rollers up to 5 metres long and 6000 kg of weight.

triplex robot 700

The ceramic coating represents a critical part of the Anilox roller as it affects the consistency of the engraving and most importantly its longevity. There are hundreds of variables in the plasma spray process which determine the coating quality. By using the latest and most sophisticated fully automated system for coating application, Cheshire Anilox Technology controls the critical parameters in the plasma process to achieve a consistent, extremely dense and wear resistant ceramic.

The riplexPro®200 plasma spray gun is configured to produce very stable, fixed-length plasma arcs that are completely independent of the nozzle geometry. This design not only incorporates the best features of its predecessor the Triplex III, but has a higher throughput, improved process stability and excellent reproducibility. The deposition of coating and porosity is greatly improved resulting in a much harder surface of around 1600 HV.

The new TriplexPro®200 chamber is fully operational and available to customers since 1st July 2011.

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